Diffusion furnace tubes, as core components in solar photovoltaic and semiconductor manufacturing processes, undertake the important task of uniformly injecting dopants into silicon wafers at high temperatures. Most of them are made of high-temperature resistant, chemically stable quartz or special alloys to ensure stable operation in high-temperature environments. During operation, the silicon wafer is carefully placed inside the furnace tube, and then the doping gas is precisely controlled and introduced into the furnace. Through precisely controlled temperature and time, the dopant can be uniformly and effectively penetrated into the designated area of ​​the silicon wafer. The design of the diffusion furnace tube is delicate and complex. Its structure, material and process level are directly related to the accuracy and efficiency of doping. It is an indispensable key equipment in the manufacturing process of photovoltaic cells and semiconductors.

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